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AutoCAD Free Download LT - "Lite" version of AutoCAD Crack For Windows AutoCAD Cracked Accounts Architecture - architectural design and detailing application Cracked AutoCAD With Keygen Electrical - electrical design and installation AutoCAD Full Crack Civil 3D - civil engineering, construction, and design List of AutoCAD For Windows 10 Crack Plugins See also The following list is a list of applications built using AutoCAD Crack Keygen: List of AutoCAD Crack For Windows plug-ins List of AutoCAD Full Crack software References External links Official AutoCAD Serial Key web site AutoCAD Cracked Version solutions overview AutoCAD Crack Keygen Toolkit AutoCAD Crack Free Download.mde AutoCAD 2022 Crack online help AutoCAD 2022 Crack API - Microsoft AutoCAD Activation Code API AutoCAD Cracked Accounts API AutoCAD Cracked Accounts API Overview Category:Autodesk Category:Computer-aided design software Category:Computer-aided design software for WindowsThe present invention relates to a polishing pad for chemical-mechanical polishing, an abrasive comprising such a polishing pad and their use in chemical-mechanical polishing of wafers. In the field of manufacture of integrated circuits, chemical-mechanical polishing (CMP) has become an essential technique of planarization of interlayer dielectric layers. In CMP, a wafer is positioned on a wafer carrier. The wafer carrier is moved relative to a polishing pad and the surface of the wafer is polished by a mixture of slurry and of pressurized chemicals. In general, the polishing pad is formed as a flat elastic pad with a certain thickness, which may be of a non-woven or woven material or made of a foamed resin such as polyurethane. The polishing pad is placed on a circular, oval, or square-shaped plate-shaped carrier with a back surface sloped for turning the polishing pad. This carrier is rotatably mounted on a spindle of a polishing apparatus. In the polishing process, the surface of the wafer is polished by a mixture of slurry and of pressurized chemicals. Therefore, it is required for the surface of the polishing pad to be resistant to the chemicals and to the chemicals and the slurry. In addition, the surface of the polishing pad should not scratch the surface of the wafer. The polishing pad has a polishing surface which is contacted with the surface of the wafer during polishing of the wafer. e315de8065
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